Yetunde Sokefun

Yetunde is a highly motivated Ph.D. Chemical Engineer with extensive experience in semiconductor process integration, yield optimization, and advanced materials R&D. As a Process Integration Development Engineer at Intel Corporation, she co-chaired dual damascene patterning focus teams, delivering process changes that reduced defect density by over 50% and surpassing 2025 targets. She led cross-functional task forces for root-cause analysis, founded the bevel working group to address BEOL edge defects, and executed complex DOEs to enable rapid, data-driven process qualification. With expertise in SEM, TEM, XRD, FTIR, and statistical modeling (DOE, SPC, JMP), Yetunde holds a Ph.D. focused on heterogeneous catalysis and materials chemistry. She brings proven leadership in troubleshooting process excursions, technology transfer protocols, and delivering robust manufacturing solutions to life sciences organizations seeking process development excellence.